Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

I. Baía, Francisco Manuel Braz Fernandes, Patrícia Nunes, M. Quintela, Rodrigo Ferrão de Paiva Martins

Research output: Contribution to journalArticlepeer-review

34 Citations (Scopus)

Abstract

This paper presents results of the role of the oxygen concentration (CO) and the deposition pressure (pd) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by CO than by pd, the same does not happen with the electrical properties.

Original languageEnglish
Pages (from-to)244-247
Number of pages4
JournalThin Solid Films
Volume383
Issue number1-2
DOIs
Publication statusPublished - 15 Feb 2001

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