Multicomponent wide band gap oxide semiconductors for thin film transistors

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Abstract

The recent application of wide band gap oxide semiconductors to transparent thin film transistors (TTFTs) is making a fast and growing (r)evolution on the contemporary solid-state electronics. In this paper we present some of the recent results we have obtained using wide band gap oxide semiconductors, like indium zinc oxide, produced by rf sputtering at room temperature. The devices work in the enhancement mode and exhibit excellent saturation drain currents. On-off ratios above 10(6) are achieved. The optical transmittance data in the visible range reveals average transmittance higher than 80 %, including the glass substrate. Channel mobilities are also quite respectable, with some devices presenting values around 25 cm(2)/Vs. even without any annealing or other post deposition improvement processes. The high performances presented by these TTFTs associated to a high electron mobility, at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and a low threshold voltage, opens new doors for applications in flexible, wearable, disposable portable electronics as well as battery-powered applications.
Original languageEnglish
Title of host publicationProceedings of International Meeting on Information Display
Pages605-608
Number of pages4
Publication statusPublished - 1 Jan 2006
Event6th International Meeting on Information Displays/5th International Display Manufacturing Conference (IMID/IDMC 2006) -
Duration: 1 Jan 2006 → …

Conference

Conference6th International Meeting on Information Displays/5th International Display Manufacturing Conference (IMID/IDMC 2006)
Period1/01/06 → …

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