Properties of ITO films deposited by plasma enhanced RTE on unheated polymer sheets - dependence on rf electrode distance from substrates

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Abstract

The influence of the radio frequency (rf) electrode distance from substrates on the properties of indium tin oxide (ITO) films (90 nm thick) deposited by plasma enhanced RTE onto unheated polymer substrates is studied. This distance varied in the range 6-12 cm. The polymeric substrate used was PET. Results showed that (1) an average visible transmittance of around 80% and (2) an electrical resistivity of 1.5×10-3 Ωcm are obtained for ITO films deposited on PET with the rf electrode 10 cm from substrates. On glass, the value of the electrical resistivity obtained is slightly lower ≈9×10-4 Ωcm. A study of the ITO thickness uniformity on a polymer substrate of reasonable area (15×15 cm2) revealed an uniformity of about 80%
Original languageEnglish
Pages (from-to)630-633
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume338-40
Issue number1 SPEC. ISS.
DOIs
Publication statusPublished - 15 Jun 2004

Keywords

  • Deposition
  • Electrochemical electrodesE
  • Evaporation
  • Hall effect
  • Heat treatment
  • Moisture
  • Scanning electron microscopy
  • Semiconducting indium compounds
  • Synthesis (chemical)
  • Thin films
  • Free carrier concentration
  • Polymeric substrate
  • Radio frequency
  • Reactive thermal evaporation
  • Radio frequencyy
  • Polymers

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