Properties of ZnO thin films deposited by spray pyrolysis and magnetron sputtering

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Abstract

In this work we present a study of the properties of ZnO thin films produced by spray pyrolysis and r.f. magnetron sputtering. Before the annealing treatment the properties of the films are very similar, which means that the films produced by both techniques could be used on optoelectronic devices. However spray pyrolysis is a more simple and cheap technique than sputtering, but with this last technique the thin films exhibit a higher uniformity.

Original languageEnglish
Title of host publicationAdvanced Materials and Devices for Large-Area Electronics
Pages128-133
Number of pages6
Volume685
Publication statusPublished - 2001
Event2001 MRS Spring Meeting - San Francisco, CA, United States
Duration: 16 Apr 200120 Apr 2001

Conference

Conference2001 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period16/04/0120/04/01

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