Role of the gas flow parameters on the uniformity of films produced by PECVD technique

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The aim of this work is to present an analytical model able to interpret the experimental data of the dependence of film's uniformity on the discharge pressure, gas flow and temperature used during the production of thin films by the plasma enhancement chemical vapour deposition technique, under optimised electrode's geometry and electric field distribution. To do so, the gas flow is considered to be quasi-incompressible and inviscous leading to the establishment of the electro-fluid-mechanics equations able to interpret the film's uniformity over the substrate area, when the discharge process takes place in the low power regime.

Original languageEnglish
Pages (from-to)609-614
Number of pages6
JournalMRS Proceedings
Volume467
Publication statusPublished - 1997

Fingerprint Dive into the research topics of 'Role of the gas flow parameters on the uniformity of films produced by PECVD technique'. Together they form a unique fingerprint.

Cite this